Fundamentals of Electrochemical Deposition

Milan Paunovic, Mordechay Schlesinger

374 pages, parution le 22/08/2006 (2^eme édition)

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Résumé

Excellent teaching and resource material . . . it is concise, coherently structured, and easy to read . . . highly recommended for students, engineers, and researchers in all related fields."
Corrosion on the First Edition of Fundamentals of Electrochemical Deposition

From computer hardware to automobiles, medical diagnostics to aerospace, electrochemical deposition plays a crucial role in an array of key industries. Fundamentals of Electrochemical Deposition, Second Edition is a comprehensive introduction to one of today's most exciting and rapidly evolving fields of practical knowledge.

The most authoritative introduction to the field so far, the book presents detailed coverage of the full range of electrochemical deposition processes and technologies, including:

Metal-solution interphase
Charge transfer across an interphase
Formation of an equilibrium electrode potential
Nucleation and growth of thin films
Kinetics and mechanisms of electrodeposition
Electroless deposition
In situ characterization of deposition processes
Structure and properties of deposits
Multilayered and composite thin films
Interdiffusion in thin film
Applications in the semiconductor industry and the field of medicine

This new edition updates the prior edition to address the new developments in the science and its applications, with new chapters on innovative applications of electrochemical deposition in semiconductor technology, magnetism and microelectronics, and medical instrumentation. Added coverage includes such topics as binding energy, nanoclusters, atomic force, and scanning tunneling microscopy. Example problems at the end of chapters and other features clarify and improve understanding of the material.

Written by an author team with extensive experience in both industry and academe, this reference and text provides a well-rounded introduction to the field for students, as well as a means for professional chemists, engineers, and technicians to expand and sharpen their skills in using the technology.

L'auteur - Milan Paunovic

Milan Paunovic, PhD, was, until recently, a research staff member in the Electrodeposition Technology Department at the IBM T. J. Watson Research Center. He began work on electrochemical metal deposition in 1961 at the University of Pennsylvania, Philadelphia, and subsequently worked on metal deposition at Reynolds Metals, Kollmorgen, and Intel. He is a coauthor of the first edition of Fundamentals of Electrochemical Deposition and Modern Electroplating (both by Wiley), has edited four symposia proceedings volumes of The Electrochemical Society, published forty-one papers, and holds seven patents.

L'auteur - Mordechay Schlesinger

Mordechay Schlesinger, PhD, is a professor in the Department of Physics at the University of Windsor, Ontario, Canada. He is a former associate editor of both the Journal of The Electrochemical Society and Electrochemical and Solid State Letters. He is a fellow of the American Physical Society and The Electrochemical Society. He has also been named a General Motors Academic Research Fellow. He is a coauthor of the first edition of Fundamentals of Electrochemical Deposition and of Modern Electroplating. He has published over 120 research papers and holds four patents.

Sommaire

Preface to the Second Edition
Preface to the First Edition
Overview
Water and Ionic Solutions
Metals and Metal Sufaces
Metal-Solution Interphase
Equilibrium Electrode Potential
Kinetics and Mechanism of Electrodeposition
Nucleation and Growth Models
Electroless Deposition
Displacement Deposition
Effect of Additives
Electrodeposition of Alloys
Metal Deposit and Current Distribution
Characterization of metallic Surfaces and Thin Films
In Situ Characterization of Deposition
Mathematical Modeling in Electrochemistry
Structure and Properties of Deposits
Electrodeposited Multilayers
Interdiffusion in Thin Films
Applications in Semiconductors Technology
Applications in the Fields of Magnetism and Microelectronics
Frontiers in Applications: Applications in the Field of Medicine
Index

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Caractéristiques techniques

	PAPIER
Éditeur(s)	Wiley
Auteur(s)	Milan Paunovic, Mordechay Schlesinger
Parution	22/08/2006
Édition	2^eme édition
Nb. de pages	374
Format	16 x 24
Couverture	Relié
Poids	662g
Intérieur	Noir et Blanc
EAN13	9780471712213
ISBN13	978-0-471-71221-3