Fundamentals of Semiconductor Fabrication

Gary S. May, Simon M. Sze

306 pages, parution le 25/06/2003

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Résumé

This concise introduction to semiconductor fabrication technology covers everything professionals need to know, from crystal growth to integrated devices and circuits. Throughout, the authors address both theory and the practical aspects of each major fabrication step, including crystal growth, silicon oxidation, photolithography, etching, diffusion, ion implantation, and thin film deposition.

The book integrates Computer Modeling & Simulation tools throughout.
Process simulation is used as a tool for what-if analysis and discussion.
Comprehensive coverage of process sequences helps readers connect individual steps into a cohesive whole.

Introduction
Crystal Growth
Silicon Oxidation
Photolithography
Etching
Diffusion
Ion Implantation
Film Deposition
Process Integration
IC Manufacturing
Future Trends and Challenges
Appendix A: List of Symbols
Appendix B: International System of Units (SI Units)
Appendix C: Unit Prefixes
Appendix D: Greek Alphabet
Appendix E: Physical Constants
Appendix F: Properties of Si and GaAs at 300K
Appendix G: Some Properties of the Error Function
Appendix H: Basic Kinetic Theory of Gases
Appendix I: SUPREM Commands
Appendix J: Running PROLITH
Appendix K Percentage Points of the t Distribution
Appendix L: Percentage Points of the F Distribution
Index

L'auteur - Gary S. May

Gary S. May Ph.D. is Executive Assistant to the President and Motorola Foundation Professor of Microelectronics in the School of Electrical and Computer Engineering at the Georgia Institute of Technology. Dr. May was a national Science Foundation national Young Investigator, Georgia Tech's Outstanding Young Alumnus, received Georgia Tech's Outstanding Service Award, and was named a Giant of Science by the Quality Education for Minorities network in 2001. He was a member of the NSF Engineering Advisory Committee, served on and chaired the NSF Committee for Equal Opportunity in Science and Engineering, and was Editor-in-Chief for IEEE Transactions of Semiconductor Manufacturing from 1997 to 2001. Dr. May currently serves as chair of the National Advisory Board for the National Society of Black Engineers.

L'auteur - Simon M. Sze

Simon M. Sze, Ph.D. is UMC Chair Professor of National Chiao Tung University, and President of the National Nano Device Laboratories. He has received the IEEE Ebers Award, the Sun Yet-sen Award, the National Science and Technology Award, and the National Chair Professor Award. He is a Life Fellow of IEEE, a member of the Academia Sinica, the Chinese Academy of Engineering, and the US National Academy of Engineering. He has authored or coauthored over 150 technical papers, and has written, edited, and contributed to 24 books. His book Physics of Semiconductor Devices (Wiley 1969, 2nd Ed, 1981) is the most cited work in contemporary engineering and applied science publications (over 12,000 citations from ISI Press).

Caractéristiques techniques

	PAPIER
Éditeur(s)	Wiley
Auteur(s)	Gary S. May, Simon M. Sze
Parution	25/06/2003
Nb. de pages	306
Format	18 x 26
Couverture	Relié
Poids	710g
Intérieur	Noir et Blanc
EAN13	9780471452386