Materials science of thin films

Since 1992, when the book was first published, the field of thin films has expanded tremendously, especially with regard to technological applications. The second edition will bring the book up-to-date with regard to these advances. Most chapters have been greatly updated, and several new chapters have been added.

Author Biography: Dr. Milton Ohring, author of two acclaimed Academic Press books, The Materials Science of Thin Films (l992) and Engineering Materials Science (1995), has taught courses on reliability and failure in electronics at Bell Laboratories (AT&T and Lucent Technologies). From this perspective and the well-written tutorial style of the book, the reader will gain a deeper physical understanding of failure mechanisms in electronic materials and devices; acquire skills in the mathematical handling of reliability data; and better appreciate future technology trends and the reliability issues they raise.

Contents

• Chapter 1 A Review of Material Science
• Chapter 2 Vacuum Science and Technology
• Chapter 3 Thin-Film Evaporation Processes
• Chapter 4 Discharges, Plasmas, and Ion-Surface Interactions
• Chapter 5 Plasma and Ion Beam Processing of Thin Films
• Chapter 6 Chemical Vapor Deposition
• Chapter 7 Substrate Surfaces and Thin-Film Nucleation
• Chapter 8 Epitaxy
• Chapter 9 Film Structure
• Chapter 10 Characterization of Thin Films and Surfaces
• Chapter 11 Interdiffusion, Reactions, and Transformation in Thin Films
• Chapter 12 Mechanical Properties of Thin Films
• Index