Photomask Fabrication Technology

Benjamin Eynon, Banqiu Wu - Collection Electronic Engineering

600 pages, parution le 19/09/2005

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Résumé

A must-have guide for engineers developing photomask manufacturing processes, Photomask Fabrication Technology fully explains the technology behind industrial photomask production, focusing on practical applications. Readers will find complete details on fundamental principles, industrial production flows, technological evolution and development, and state-of-the-art advancements.

Photomasks, the printing masters for the fabrication of integrated circuits, have become a necessity of modern semiconductor manufacturing. This book details the science and technology of industrial photo mask production, including fundamental principles, industrial production flows, and technological evolution.

L'auteur - Benjamin Eynon

Benjamin G. Eynon, Jr., is Senior Director of Product Marketing at KLA-Tencor Corporation. He has more than 18 years of experience in wafer and photomask industry technology.

L'auteur - Banqiu Wu

Banqiu Wu, Ph.D. is a Senior Staff Scientist at Photronics, Inc. He has expert-level photomask fabrication experience in the pattern transfer process.

Sommaire

Introduction
Data preparation
Pattern generation
Photomask pattern transfer
Photomask metrology
Process back end and defectivity control
Resolution enhancement techniques
NGL mask technology introduction

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Caractéristiques techniques

	PAPIER
Éditeur(s)	Mc Graw Hill
Auteur(s)	Benjamin Eynon, Banqiu Wu
Collection	Electronic Engineering
Parution	19/09/2005
Nb. de pages	600
Format	15,5 x 24
Couverture	Relié
Poids	920g
Intérieur	Noir et Blanc
EAN13	9780071445634
ISBN13	978-0-07-144563-4